A SLOW POSITRON STUDY INTO THE RECOVERY BEHAVIOR OF AS-POLISHED AND KRYPTON-IMPLANTED URANIUM-DIOXIDE

被引：7

作者：

EVANS, HE ^{[1
]}

EVANS, JH ^{[1
]}

RICEEVANS, P ^{[1
]}

SMITH, DL ^{[1
]}

SMITH, C ^{[1
]}

机构：

[1] AEA TECHNOL,HARWELL LAB,REACTOR SERV,HARWELL OX11 0RA,OXON,ENGLAND

来源：

JOURNAL OF NUCLEAR MATERIALS | 1992年 / 199卷 / 01期

关键词：

D O I：

10.1016/0022-3115(92)90442-N

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：79 / 83

页数：5

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