INFLUENCE OF ION MIXING ON THE DEPTH RESOLUTION OF SPUTTER DEPTH PROFILING

被引：7

作者：

CHENG, YT ^{[1
]}

DOW, AA ^{[1
]}

CLEMENS, BM ^{[1
]}

CIRLIN, EH ^{[1
]}

机构：

[1] HUGHES RES LABS,MALIBU,CA 90265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576064

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1641 / 1645

页数：5

共 50 条

[41] OPTIMIZED ION-BEAM RASTER FOR SIMS SPUTTER DEPTH PROFILING
MITCHELL, DF
ARLOW, JS
PHILLIPS, JR
SPROULE, GI
SURFACE AND INTERFACE ANALYSIS, 1989, 14 (6-7) : 302 - 306
[42] STUDY OF ION-BEAM INDUCED MIXING DURING SPUTTER DEPTH PROFILING OF THIN-FILMS BY LEIS
PURANIK, SG
KING, BV
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 34 (01): : 102 - 112
[43] DEPENDENCE OF DEPTH RESOLUTION ON SPUTTERING ION SPECIES AND ENERGY IN AUGER SPUTTER DEPTH PROFILING ANALYSIS OF GALLIUM-ARSENIDE - ALUMINUM ARSENIDE FILMS
OGIWARA, T
TANUMA, S
TAKAKUSAGI, M
BUNSEKI KAGAKU, 1990, 39 (05) : 277 - 281
[44] THE INFLUENCE OF SURFACE-TOPOGRAPHY ON THE DEPTH RESOLUTION OF THE PIGE DEPTH PROFILING TECHNIQUE
PLIER, F
ZSCHAU, HE
OTTO, G
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 66 (1-2): : 38 - 42
[45] DEPTH PROFILING BY ION MICROPROBE WITH HIGH MASS RESOLUTION
DEGREVE, F
FIGARET, R
LATY, P
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1979, 29 (04): : 351 - 361
[46] Oxygen depth profiling with subnanometre depth resolution
Kosmata, Marcel
Munnik, Frans
Hanf, Daniel
Groetzschel, Rainer
Crocoll, Sonja
Moeller, Wolfhard
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2014, 337 : 27 - 33
[47] CROSS-CORRELATION VERSUS CONVOLUTION - A MATTER OF CONVENTION - A COMMENT ON THE DEPTH DEPENDENCE OF THE DEPTH RESOLUTION IN SPUTTER PROFILING
SANZ, JM
SURFACE AND INTERFACE ANALYSIS, 1984, 6 (04) : 196 - 196
[48] DEPTH RESOLUTION FOR SPUTTER SECTIONING OF NI
MACHT, MP
WILLECKE, R
NAUNDORF, V
VACUUM, 1990, 41 (7-9) : 1674 - 1675
[49] THE EFFECT OF SURFACE-TOPOGRAPHY EVOLUTION ON SPUTTER PROFILING DEPTH RESOLUTION IN SI
CARTER, G
NOBES, MJ
LEWIS, GW
BROWN, CR
SURFACE AND INTERFACE ANALYSIS, 1985, 7 (01) : 35 - 40
[50] DEPTH RESOLUTION IN SPUTTER PROFILING - EVIDENCE AGAINST SEQUENTIAL LAYER SPUTTERING MODEL
WITTMAACK, K
SCHULZ, F
THIN SOLID FILMS, 1978, 52 (02) : 259 - 270

← 1 2 3 4 5 →