INFLUENCE OF ION MIXING ON THE DEPTH RESOLUTION OF SPUTTER DEPTH PROFILING

被引：7

作者：

CHENG, YT ^{[1
]}

DOW, AA ^{[1
]}

CLEMENS, BM ^{[1
]}

CIRLIN, EH ^{[1
]}

机构：

[1] HUGHES RES LABS,MALIBU,CA 90265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576064

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1641 / 1645

页数：5

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