INFLUENCE OF ION MIXING ON THE DEPTH RESOLUTION OF SPUTTER DEPTH PROFILING

被引：7
作者：
CHENG, YT [1 ]
DOW, AA [1 ]
CLEMENS, BM [1 ]
CIRLIN, EH [1 ]
机构：
[1] HUGHES RES LABS,MALIBU,CA 90265
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.576064
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1641 / 1645
页数：5
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