CONTACT RESISTIVITIES OF AL AND TI ON SI MEASURED BY A SELF-ALIGNED VERTICAL KELVIN TEST RESISTOR STRUCTURE

被引：0
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作者：
WEN, LY
TAN, FL
CHUNG, LL
机构：
来源：
SOLID-STATE ELECTRONICS | 1989年 / 32卷 / 11期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：997 / 1001
页数：5
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