NATURE OF DOPING INTO PURE SILICA GLASS BY PLASMA TORCH CVD

被引：32

作者：

ARAI, K ^{[1
]}

NAMIKAWA, H ^{[1
]}

ISHII, Y ^{[1
]}

IMAI, H ^{[1
]}

HOSONO, H ^{[1
]}

ABE, Y ^{[1
]}

机构：

[1] NAGOYA INST TECHNOL,DEPT INORGAN CHEM,SHOWA KU,NAGOYA,AICHI 466,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 95-6卷

关键词：

D O I：

10.1016/S0022-3093(87)80164-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：609 / 616

页数：8

共 18 条

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