AFTERGLOW AND DECAYING PLASMA CVD SYSTEMS

被引：21
作者：
BARDOS, L
机构：
来源：
VACUUM | 1988年 / 38卷 / 8-10期
关键词：
D O I：
10.1016/0042-207X(88)90433-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：637 / 642
页数：6
相关论文
共 46 条
[41]   PLASMA-ASSISTED DEPOSITION PROCESSES - THEORY, MECHANISMS AND APPLICATIONS [J].
THORNTON, JA .
THIN SOLID FILMS, 1983, 107 (01) :3-19
[42]   SILICON-NITRIDE AND SILICON DIIMIDE GROWN BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION [J].
TSU, DV ;
LUCOVSKY, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :480-485
[43]   PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J].
VEPREK, S .
THIN SOLID FILMS, 1985, 130 (1-2) :135-154
[44]   COMPARISON OF MICROWAVE AND LOWER FREQUENCY PLASMAS FOR THIN-FILM DEPOSITION AND ETCHING [J].
WERTHEIMER, MR ;
MOISAN, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (06) :2643-2649
[45]  
ZDUNEK K, 1987, P INT C ION PLASMA A, P118
[46]  
ZDUNEK K, 1985, P INT C ION PLASMA A, P183
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