AFTERGLOW AND DECAYING PLASMA CVD SYSTEMS

被引：21
作者：
BARDOS, L
机构：
来源：
VACUUM | 1988年 / 38卷 / 8-10期
关键词：
D O I：
10.1016/0042-207X(88)90433-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：637 / 642
页数：6
相关论文
共 46 条
[1]   SILICON-NITRIDE FILMS PREPARED BY PACVD OUTSIDE THE PLASMA [J].
BARDOS, L ;
MUSIL, J .
CZECHOSLOVAK JOURNAL OF PHYSICS, 1985, 35 (12) :1437-1444
[2]   DIFFERENCES BETWEEN MICROWAVE AND RF ACTIVATION OF NITROGEN FOR THE PECVD PROCESS [J].
BARDOS, L ;
MUSIL, J ;
TARAS, P .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1982, 15 (07) :L79-L82
[3]   NITROGEN ACTIVATION FOR PLASMA CHEMICAL SYNTHESIS OF THIN SI3N4 FILMS [J].
BARDOS, L ;
MUSIL, J ;
TARAS, P .
THIN SOLID FILMS, 1983, 102 (02) :107-110
[4]  
BARDOS L, 1984, CZECH J PHYS, V34, P1242, DOI 10.1007/BF01590071
[5]   NEW WAY FOR HIGH-RATE A-SI DEPOSITION [J].
BARDOS, L ;
DUSEK, V ;
VANECEK, M .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 :281-284
[6]   HIGH-RATE JET PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J].
BARDOS, L ;
DUSEK, V .
THIN SOLID FILMS, 1988, 158 (02) :265-270
[7]   NEGATIVE ROLE OF FAST ELECTRONS IN MICROWAVE OXIDATION OF SILICON [J].
BARDOS, L ;
MUSIL, J ;
ZACEK, F ;
HULENYI, L .
CZECHOSLOVAK JOURNAL OF PHYSICS, 1978, 28 (06) :639-643
[8]   METHOD OF FORMATION OF THIN OXIDE-FILMS ON SILICON IN A MICROWAVE MAGNETOACTIVE OXYGEN PLASMA [J].
BARDOS, L ;
LONCAR, G ;
STOLL, I ;
MUSIL, J ;
ZACEK, F .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (16) :L195-L197
[9]  
BARDOS L, 1983, ROZPRAVY CSAV, V93
[10]  
BARDOS L, UNPUB J PHYS D
12345