REFINEMENT OF CRYSTAL-STRUCTURE OF TISI2 AND SOME COMMENTS ON BONDING IN TISI2 AND RELATED COMPOUNDS

被引:59
|
作者
JEITSCHKO, W [1 ]
机构
[1] DUPONT CO,DEPT CENT RES & DEV,EXPTL STN,WILMINGTON,DE 19898
来源
ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL SCIENCE | 1977年 / 33卷 / JUL15期
关键词
D O I
10.1107/S0567740877008462
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:2347 / 2348
页数:2
相关论文
共 50 条
  • [21] Tuning interfacial two-component superconductivity in CoSi2/TiSi2 heterojunctions via TiSi2 diffusivity
    Chiu, Shao-Pin
    Mishra, Vivek
    Li, Yu
    Zhang, Fu-Chun
    Kirchner, Stefan
    Lin, Juhn-Jong
    NANOSCALE, 2023, 15 (20) : 9179 - 9186
  • [22] STRUCTURE AND PROPERTIES OF TISI2 THIN-FILMS AND TISI2-SI(111) INTERFACES
    VALIEV, KA
    VASILIEV, AG
    VASILIEV, AL
    KISELEV, NA
    ORLIKOVSKY, AA
    SEDELNIKOV, AE
    SURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3) : 281 - 291
  • [23] SILICON LOSS DURING TISI2 FORMATION
    COHEN, C
    NIPOTI, R
    SIEJKA, J
    BENTINI, GG
    BERTI, M
    DRIGO, AV
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (11) : 5187 - 5189
  • [24] LIMITATIONS OF TISI2 AS A SOURCE FOR DOPANT DIFFUSION
    PROBST, V
    SCHABER, H
    LIPPENS, P
    VANDENHOVE, L
    DEKEERSMAECKER, R
    APPLIED PHYSICS LETTERS, 1988, 52 (21) : 1803 - 1805
  • [25] Theoretical Limit of TiSi2 Contact Resistance
    Jeong, M. Y.
    Pourghaderi, M. A.
    Vuttivorakulchai, K.
    Song, S.
    Kim, Y. -S.
    Voros, M.
    Jin, S.
    Lee, B.
    Choi, W.
    Kwon, U.
    Kim, D. S.
    2023 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES, SISPAD, 2023, : 105 - 108
  • [26] INTERACTION OF TISI2 LAYERS WITH POLYCRYSTALLINE SI
    ZHENG, LR
    HUNG, LS
    FENG, SQ
    REVESZ, P
    MAYER, JW
    MILES, G
    APPLIED PHYSICS LETTERS, 1986, 48 (12) : 767 - 769
  • [27] LOW-TEMPERATURE NITRIDATION OF TISI2
    MANN, R
    BAXTER, R
    TICE, W
    FRIDMANN, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C451 - C451
  • [28] TiSi2 phase transformation by amorphization techniques
    Karlin, T
    Samuelsson, M
    Nygren, S
    Ostling, M
    THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 283 - 288
  • [29] THERMODYNAMIC AND EXPERIMENTAL STUDIES OF THE APCVD OF TISI2
    MILLIONBRODAZ, JF
    VAHLAS, C
    BERNARD, C
    TORRES, J
    MADAR, R
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1987, 42 (236): : 191 - 194
  • [30] Morphological stability of TiSi2 on polycrystalline silicon
    Chen, JF
    Chen, LJ
    THIN SOLID FILMS, 1997, 293 (1-2) : 34 - 39