ELECTRON-SPIN-RESONANCE STUDIES OF POLY(METHYL METHACRYLATE) IRRADIATED WITH MONOCHROMATIC LIGHT

被引：7

作者：

TORIKAI, A

MITSUOKA, T

机构：

[1] Nagoya Univ, Nagoya, Japan

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1995年 / 55卷 / 12期

关键词：

D O I：

10.1002/app.1995.070551210

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Recent study on the wavelength sensitivity of photodegradation of poly(methyl methacrylate) (PMMA) in the presence and absence of oxygen showed that (1) multi-chain scission of PMMA takes place by the irradiation of light of a wavelength shorter than 320 min; and (2) there are two processes which cause main chain scission of PMMA. Judging from the multi-chain scission values obtained in this experiment, direct main scission takes place mainly on irradiation of 300 nm light, while main chain scission following side-chain scission takes place with the light of a wavelength shorter than 280 nm. This study helps clarify the precursors of the photodegradation and confirm the previous results. Monochromatic light irradiations to PMMA at 77 and 296 K in vacuum were carried out for this purpose.

引用

页码：1703 / 1706

页数：4

共 7 条

[1]

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[2] CHARACTERIZATION OF A DISSOCIATIVE EXCITED-STATE IN THE SOLID-STATE - PHOTOCHEMISTRY OF POLY(METHYL METHACRYLATE) - PHOTOCHEMICAL PROCESSES IN POLYMERIC SYSTEMS .5. [J].