The results of structural and magnetic measurements on films, produced by serially depositing R2Fe14B (R = Nd, Pr) and Ta, are reported. The materials were deposited 10-200 angstrom at a time onto 500-700-degrees-C Ta substrates. The structures of the resulting films were examined by large- and small-angle X-ray diffraction. The magnetic properties were studied at room temperature in a Vibrating Sample Magnetometer (VSM) with a maximum field of 17.1 kOe, and at cryogenic temperatures in a VSM with a maximum field of 80 kOe. The structural and magnetic properties depend upon the nominal thickness of the Ta, even though interlayer diffusion appears to be significant for Ta thicknesses less than about 30 angstrom. The trends in the coercivities can be qualitatively explained by assuming a nucleation mechanism for magnetization reversal and correlating the coercivity with the degree of c-axis alignment in the 2:14:1 phase.
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Res Inst Ind Sci & Technol, Electromagnet Mat Lab, Pohang 790330, South KoreaRes Inst Ind Sci & Technol, Electromagnet Mat Lab, Pohang 790330, South Korea
Yang, CJ
Kim, SW
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Res Inst Ind Sci & Technol, Electromagnet Mat Lab, Pohang 790330, South KoreaRes Inst Ind Sci & Technol, Electromagnet Mat Lab, Pohang 790330, South Korea