NICKEL AND COBALT SILICIDES ON SILICON - THIN-FILM REACTION AND INTERFACE STRUCTURE

被引:16
作者
VANDERVEEN, JF
FISCHER, AEMJ
VRIJMOETH, J
机构
关键词
D O I
10.1016/0169-4332(89)90514-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:13 / 26
页数:14
相关论文
共 73 条
[71]   SILICIDE SILICON SCHOTTKY BARRIERS UNDER HYDROSTATIC-PRESSURE [J].
WERNER, JH .
APPLIED PHYSICS LETTERS, 1989, 54 (16) :1528-1530
[72]   STRUCTURAL REACTIONS OF SI(111) WITH COBALT AND FORMATION OF COBALT DISILICIDE [J].
WU, SC ;
WANG, ZQ ;
LI, YS ;
JONA, F ;
MARCUS, PM .
PHYSICAL REVIEW B, 1986, 33 (04) :2900-2902
[73]   INTERFACE STRUCTURE AND LATTICE MISMATCH OF EPITAXIAL COSI2 ON SI(111) [J].
ZEGENHAGEN, J ;
HUANG, KG ;
HUNT, BD ;
SCHOWALTER, LJ .
APPLIED PHYSICS LETTERS, 1987, 51 (15) :1176-1178