ELECTRON-BEAM LITHOGRAPHY

被引：0

|

作者：

EVERHART, TE ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,BERKELEY,CA 94720

来源：

BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1977年 / 22卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：276 / 276

页数：1

相关论文

共 50 条

[21] RESEARCH COMPLEX FOR ELECTRON-BEAM LITHOGRAPHY
BABIN, SV
DAVYDOV, AV
ERKO, AI
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1987, 30 (02) : 463 - 469
[22] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
LIU, W
INGINO, J
PEASE, RF
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
[23] PRACTICAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY
LIVESAY, WR
SOLID STATE TECHNOLOGY, 1984, 27 (02) : 109 - 109
[24] ELECTRON-BEAM LITHOGRAPHY - A GATING ITEM
CLEMENS, JT
SOLID STATE TECHNOLOGY, 1989, 32 (03) : 69 - 72
[25] ELECTRON-BEAM LITHOGRAPHY FOR MICROCIRCUIT FABRICATION
AHMED, H
ELECTRONICS AND POWER, 1976, 22 (07): : 433 - 436
[26] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
YONEDA, Y
KITAMURA, K
NAITO, J
KITAKOHJI, T
OKUYAMA, H
MURAKAWA, K
POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16) : 1110 - 1114
[27] SOME LIMITATIONS ON ELECTRON-BEAM LITHOGRAPHY
CREWE, AV
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 255 - 259
[28] ELECTRON-BEAM LITHOGRAPHY ERROR SOURCES
CHEN, CK
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 471 : 2 - 7
[29] PHYSICAL PRINCIPLES OF ELECTRON-BEAM LITHOGRAPHY
AHMED, H
SCIENCE PROGRESS, 1986, 70 (280) : 473 - 487
[30] ALIGNMENT SIGNALS FOR ELECTRON-BEAM LITHOGRAPHY
LIN, YC
NEUREUTHER, AR
SOLID STATE TECHNOLOGY, 1984, 27 (02) : 117 - 122

← 1 2 3 4 5 →