ION-BEAM DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS

被引：4

作者：

KASDAN, A ^{[1
]}

GOSHORN, DP ^{[1
]}

LANFORD, WA ^{[1
]}

机构：

[1] SUNY ALBANY,ALBANY,NY 12222

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期

关键词：

D O I：

10.1116/1.571287

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：305 / 306

页数：2

共 50 条

[1] PREPARATION OF HYDROGENATED AMORPHOUS-SILICON FILMS BY ION-BEAM SPUTTERING
SARAIE, J
KOBAYASHI, M
FUJII, Y
MATSUNAMI, H
THIN SOLID FILMS, 1981, 80 (1-3) : 169 - 176
[2] HYDROGENATED AMORPHOUS-SILICON DEPOSITED BY ION-BEAM SPUTTERING
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TU, CW
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[3] OPTICAL-PROPERTIES OF THIN AMORPHOUS-SILICON AND AMORPHOUS HYDROGENATED SILICON FILMS PRODUCED BY ION-BEAM TECHNIQUES
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THIN SOLID FILMS, 1983, 100 (02) : 141 - 147
[4] ION-BEAM HYDROGENATION OF AMORPHOUS-SILICON
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[5] ION-BEAM HYDROGENATION OF AMORPHOUS-SILICON
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[6] ION-BEAM-ASSISTED DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON NITRIDE
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[7] ION-BOMBARDMENT CONTROL OF MORPHOLOGY DURING THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON THIN-FILMS BY REACTIVE ION-BEAM DEPOSITION
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APPLIED PHYSICS LETTERS, 1983, 42 (01) : 36 - 38
[8] ION-BEAM PROFILING OF GETTERED OXYGEN IN AMORPHOUS-SILICON FILMS
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[9] DIRECT ION-BEAM DEPOSITION OF AMORPHOUS HYDROGENATED CARBON-FILMS
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[10] Compact hydrogenated amorphous germanium films by ion-beam sputtering deposition
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