QUANTITATIVE-DETERMINATION OF SURFACE OXIDE THICKNESS ON DEPOSITED METAL-FILMS BY COMBINATION AUGER SPECTROSCOPY AND INERT-GAS ION-BOMBARDMENT

被引：24

作者：

HOLLOWAY, DM ^{[1
]}

机构：

[1] GE CO,ST PETERSBURG,FL 33733

来源：

APPLIED SPECTROSCOPY | 1973年 / 27卷 / 02期

关键词：

METALS AND ALLOYS - Oxidation - METALS AND ALLOYS - Thin Films - SPECTROSCOPY;

D O I：

10.1366/000370273774333803

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A technique combining Auger spectroscopy and inert gas ion bombardment has been employed for the determination of ″surface oxide″ thickness on deposited metal films. The quantitative limitation on the technique depends on knowing accurately the sputtering rate for the material under study.

引用

页码：95 / 98

页数：4

共 12 条

[1]

CHANG CC, 1971, SURF SCI, V25, P63

[2]

ELLIOTT RP, 1965, CONSTITUTION BINARY, P402

[3]

EYRING L, 1968, PROGRESS SCIENCE TEC, V3, P409

[4] IONIZATION SPECTROSCOPY OF CONTAMINATED METAL SURFACES [J].

GERLACH, RL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (04) :599-&

[5]

GUTHRIE JW, 1971, SEP C SURF STUD

[6]

LOESCHER DH, 9 P RAR EARTH C

[7]

MARCUS HL, 1969, T METALL SOC AIME, V245, P1664

[8] USE OF AUGER-ELECTRON SPECTROSCOPY AND INERT-GAS SPUTTERING FOR OBTAINING CHEMICAL PROFILES [J].

PALMBERG, PW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :160-&

[9]

SHEIBNER EJ, 1967, SURFACE SCI, V8, P427

[10]

SPENCER EG, 1971, J VAC SCI TECHNOL, V8, P552

← 1 2 →