DYNAMICAL METHOD FOR THE THERMOMECHANICAL STUDY OF THIN MEMBRANES

被引：20

作者：

BERRY, BS ^{[1
]}

PRITCHET, WC ^{[1
]}

UZOH, CE ^{[1
]}

机构：

[1] IBM CORP,GTD,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584490

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1565 / 1569

页数：5

共 8 条

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[3]

BERRY BS, 1988, DIFFUSION PHENOMENA, P88

[4]

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[5] EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS [J].

KARNEZOS, M .

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[6]

RAYLEIGH, 1945, THEORY SOUND, pCH9

[7]

UZOH C, 1987, J VAC SCI TECHNOL B, V5, P226

[8] MECHANICAL CHARACTERIZATION OF MEMBRANES FOR X-RAY-LITHOGRAPHY MASKS [J].

UZOH, CE ;

MALDONADO, JR ;

DANA, SS ;

ACOSTA, R ;

BABICH, I ;

VLADIMIRSKY, O .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2178-2183

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