THE FAR INFRARED SPECTRA OF CF3CH3, CF3CH2CL, CF3CHCL2 AND CF3CCL31

被引：15
|
作者：
CATALANO, E
PITZER, KS
机构：
来源：
JOURNAL OF PHYSICAL CHEMISTRY | 1958年 / 62卷 / 07期
关键词：
D O I：
10.1021/j150565a017
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：838 / 890
页数：53
相关论文
共 50 条
  • [41] Synthesis, spectroscopy and structure of CF3CH2OCN, CF3CH2NCO, and (CF3CH2O)2CNH
    Pasinszki, T
    Havasi, B
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2003, 5 (09) : 1752 - 1759
  • [42] Halogenation effects in electron scattering from CHF3, CH2F2, CH3F, CHCl3, CH2Cl2, CH3Cl, CFCl3, CF2Cl2, and CF3Cl
    Natalense, APP
    Bettega, MHF
    Ferreira, LG
    Lima, MAP
    PHYSICAL REVIEW A, 1999, 59 (01): : 879 - 881
  • [43] ATMOSPHERIC CHEMISTRY AND ENVIRONMENTAL IMPACT OF CF3CF=CH2 (HFO-1234yf), E-CF3CH=CHF (1234ze(E)), CF3CF=CF2, (FO-1216), Z-CF3CH=CHCl (HCFO-1233zd(Z)), and E-CF3-CH=CHCl (HCFO-1233zd(E))
    Wallington, T. J.
    Singh, R. R.
    1ST IIR INTERNATIONAL CONFERENCE ON THE APPLICATION OF HFO REFRIGERANTS, 2018, : 315 - 322
  • [44] Auger electron spectra of CF3CN, CF3Cl, CF2Cl2 and CFCl3
    Shimizu, Y
    Ueda, K
    Chiba, H
    Okunishi, M
    Ohmori, K
    Sato, Y
    Suzuki, IH
    Ibuki, T
    Okada, K
    CHEMICAL PHYSICS, 1999, 244 (2-3) : 439 - 448
  • [45] KINETICS STUDY OF THE TEMPERATURE-DEPENDENCE OF THE REACTIONS OF OH(2II) WITH CF3CHCL2, CF3CHCIF, AND CF2CLCH2CL
    WATSON, RT
    RAVISHANKARA, AR
    MACHADO, G
    WAGNER, S
    DAVIS, DD
    INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1979, 11 (02) : 187 - 197
  • [46] Catalytic fluorination of trichloroethene by anhydrous hydrogen fluoride in the presence of fluorinated chromia under static conditions.: Synthesis of [18F]-labelled CF3CH2F and [36Cl]-labelled CF3CH2Cl.: Catalytic dehydrofluorination of CF3CH2F and CF3CH2Cl
    Baker, AW
    Bonniface, D
    Klapötke, TM
    Nicol, I
    Scott, JD
    Scott, WDS
    Spence, RR
    Watson, MJ
    Webb, G
    Winfield, JM
    JOURNAL OF FLUORINE CHEMISTRY, 2000, 102 (1-2) : 279 - 284
  • [47] Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3
    Tran, Trung Nguyen
    Hayashi, Toshio
    Iwayama, Hiroshi
    Sekine, Makoto
    Hori, Masaru
    Ishikawa, Kenji
    APPLIED SURFACE SCIENCE, 2025, 684
  • [48] Reaction of HCFC-133a (CF3CH2Cl) or HFC-134a (CF3CH2F) with alcohols or phenols in DMSO in the presence of KOH
    Wu, K
    Chen, QY
    CHINESE JOURNAL OF CHEMISTRY, 2001, 19 (12) : 1273 - 1279
  • [49] INFRARED MULTIPHOTON ABSORPTION AND DECOMPOSITION FOR CF3CH2BR, CH3CHBRCH3, CH3CHCICH3, CH3CHCICH2CH3, CH3CF3, AND CH3CH2F
    JANGWREN, JC
    SETSER, DW
    FERRERO, JC
    JOURNAL OF PHYSICAL CHEMISTRY, 1985, 89 (03): : 414 - 426
  • [50] Substituent effects on the disproportionation-combination rate constant ratios for gas-phase halocarbon radicals .3. Reactions of CF3+CF3CH2CHCF3 and CF3CH2CHCF3+CF3CH2CHCF3
    McDowell, DR
    Holmes, BE
    INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1996, 28 (02) : 109 - 114
12345