SYNTHESIS AND CHARACTERIZATION OF POSITIVE PHOTOSENSITIVE POLYIMIDE PRECURSORS

被引:22
作者
KUBOTA, S
YAMAWAKI, Y
MORIWAKI, T
ETO, S
机构
关键词
D O I
10.1002/pen.760291413
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:950 / 953
页数:4
相关论文
共 8 条
[1]   PARAMETERS AFFECTING SENSITIVITY OF POLY(METHYL METHACRYLATE) AS A POSITIVE LITHOGRAPHIC RESIST [J].
GIPSTEIN, E ;
OUANO, AC ;
JOHNSON, DE ;
NEED, OU .
POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) :396-401
[2]   DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST [J].
GREENEICH, JS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (07) :970-976
[3]   THERMALLY STABLE PHOTORESIST POLYMER [J].
KERWIN, RE ;
GOLDRICK, MR .
POLYMER ENGINEERING AND SCIENCE, 1971, 11 (05) :426-&
[4]   PREPARATION OF POSITIVE PHOTOREACTIVE POLYIMIDES AND THEIR CHARACTERIZATION [J].
KUBOTA, S ;
MORIWAKI, T ;
ANDO, T ;
FUKAMI, A .
JOURNAL OF APPLIED POLYMER SCIENCE, 1987, 33 (05) :1763-1775
[5]  
Mittal KL, 1984, POLYIMIDES SYNTHESIS, P905
[6]  
RUBNER R, 1979, PHOTOGR SCI ENG, V23, P303
[7]  
YAMANE H, 1985, 2ND P INT C POL ELL, P86
[8]  
1985, 2ND P INT C POL NEW