APPARENT INTERFACE STATE DENSITY INTRODUCED BY SPATIAL FLUCTUATIONS OF SURFACE POTENTIAL IN AN MOS STRUCTURE

被引:46
作者
CASTAGNE, R
VAPAILLE, A
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D O I
10.1049/el:19700481
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:691 / +
页数:1
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