ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION

被引：29
|
作者：
MARUYAMA, T
KANAGAWA, T
机构：
[1] Department of Chemical Engineering, Faculty of Engineering, Kyoto University
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1994年 / 141卷 / 10期
关键词：
electrochromism chemical vapour deposition; niobium compounds; oxygen compounds; thin films; X-ray diffraction; X-ray photoelectron spectra;
D O I：
10.1149/1.2059247
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium (V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350-degrees-C. Reduction and oxidation of the films in a 0.1M Na2CO3 + 0.1M NaHCO3 buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm2. C-1.
引用
收藏
页码：2868 / 2871
页数：4
相关论文
共 50 条
  • [41] MECHANICAL-PROPERTIES OF DIAMOND THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION
    SEINO, Y
    HIDA, N
    NAGAI, S
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1992, 11 (08) : 515 - 517
  • [42] METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OF FERROELECTRIC OXIDE THIN-FILMS FOR ELECTRONIC AND OPTICAL APPLICATION
    WESSELS, BW
    ANNUAL REVIEW OF MATERIALS SCIENCE, 1995, 25 : 525 - 546
  • [43] PREPARATION OF SRTIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    KOBAYASHI, I
    WAKAO, Y
    TOMINAGA, K
    OKADA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (08): : 4680 - 4683
  • [44] GROWTH OF CAS THIN-FILMS BY SOLID SOURCE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    HELBING, R
    BIRECKI, H
    DICAROLIS, SA
    FEIGELSON, RS
    HISKES, R
    JOURNAL OF CRYSTAL GROWTH, 1995, 146 (1-4) : 599 - 603
  • [45] CHEMICAL-VAPOR-DEPOSITION OF MO THIN-FILMS FROM MO(CO)6
    SHARMA, P
    BOND, J
    WESTMORE, T
    VEAL, M
    SINGMASTER, KA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 346 - CHED
  • [46] PHOTO-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF GALLIUM SULFIDE THIN-FILMS
    PERNOT, PJ
    BARRON, AR
    CHEMICAL VAPOR DEPOSITION, 1995, 1 (03) : 75 - &
  • [47] CHEMICAL-VAPOR-DEPOSITION OF HIGH-T(C) SUPERCONDUCTING THIN-FILMS
    LESKELA, M
    MOLSA, H
    NIINISTO, L
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1993, 6 (09): : 627 - 656
  • [48] HYDROGENATION OF LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION SILICON THIN-FILMS
    ZHANG, PX
    WU, XW
    YAO, J
    WONG, SK
    JOHN, PK
    TONG, BY
    PHYSICAL REVIEW B, 1987, 36 (17): : 9168 - 9170
  • [49] PREPARATION OF LEAD MAGNESIUM NIOBATE TITANATE THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION
    TAKESHIMA, Y
    SHIRATSUYU, K
    TAKAGI, H
    TOMONO, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B): : 5083 - 5085
  • [50] Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering
    Yoshimura, K
    Miki, T
    Tanemura, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (09) : 2982 - 2985
12345