ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION

被引：29
|
作者：
MARUYAMA, T
KANAGAWA, T
机构：
[1] Department of Chemical Engineering, Faculty of Engineering, Kyoto University
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1994年 / 141卷 / 10期
关键词：
electrochromism chemical vapour deposition; niobium compounds; oxygen compounds; thin films; X-ray diffraction; X-ray photoelectron spectra;
D O I：
10.1149/1.2059247
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium (V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350-degrees-C. Reduction and oxidation of the films in a 0.1M Na2CO3 + 0.1M NaHCO3 buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm2. C-1.
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页码：2868 / 2871
页数：4
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