MULTILEVEL-GRATING ARRAY GENERATORS - FABRICATION ERROR ANALYSIS AND EXPERIMENTS

被引：54
作者：
MILLER, JM
TAGHIZADEH, MR
TURUNEN, J
ROSS, N
机构：
[1] Department of Physics, Heriot-Watt University, Riccarton
来源：
APPLIED OPTICS | 1993年 / 32卷 / 14期
关键词：
HOLOGRAPHY; COMPUTER GENERATED; OPTICAL INTERCONNECTS; MICROOPTICS;
D O I：
10.1364/AO.32.002519
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The effects of mask alignment and etch-depth errors in the array uniformity error U and diffraction efficiency eta of multilevel-grating array illuminators are evaluated numerically. Also demonstrated are 16-level fan-out elements with array size up to 32 x 16, with U = 5%-10% and eta = 83%-92%. These are fabricated with electron-beam-written binary masks, optical alignment and contact copying, and reactive ion etching. Good agreement between the predictions of the error analysis and the performance of the fabricated components is observed.
引用
收藏
页码：2519 / 2525
页数：7
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