CORRELATION BETWEEN PROCESS-INDUCED IN-PLANE DISTORTION AND WAFER BOWING IN SILICON

被引：10
作者：
YAU, LD
机构：
来源：
APPLIED PHYSICS LETTERS | 1978年 / 33卷 / 08期
关键词：
D O I：
10.1063/1.90493
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：756 / 758
页数：3
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