FABRICATION OF JOSEPHSON-JUNCTIONS USING AN AL/TA/NB STRUCTURE FOR X-RAY-DETECTION

被引：10

作者：

MOROHASHI, S

GOTOH, K

KOMIYA, S

机构：

[1] Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 06期

关键词：

D O I：

10.1063/1.111013

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We fabricated Josephson junctions using an Al/Ta/Nb structure for x-ray detection. We selected a Ta layer to be the absorber of quasiparticles generated by incident x rays to the junction because of the long lifetime of quasiparticles and the absorption efficiency for x rays. A Nb layer served not only as a barrier for quasiparticle rejection, but also as a buffer layer for deposition of a body centered cubic Ta layer without heating during deposition. An Al layer acted as not only an overlayer for the formation of the AlOx barrier, but also as a layer for quasiparticle trapping. The Nb/AlOx-Al/Ta/Nb junction showed excellent current-voltage characteristics.

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页码：785 / 787

页数：3

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