THE SATURATION OF LIGHT-INDUCED DEFECTS IN HYDROGENATED AMORPHOUS-SILICON

被引:15
作者
ISOMURA, M
HATA, N
WAGNER, S
机构
[1] Department of Electrical Engineering, Princeton University Princeton
关键词
D O I
10.1016/S0022-3093(05)80096-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We studied the temperature and intensity dependence of the saturation of the light-induced defect density, established by high-intensity Kr+ laser illumination. The saturation value of the light-induced defect density (N(sat)) is independent of temperature below about 90-degrees-C. Above 90-degrees-C N(sat) drops with increasing temperature. This behavior can be explained by the exhaustion of a limited number of defect sites, coupled with a thermal annealing process.
引用
收藏
页码:223 / 226
页数:4
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