ELECTRON DISSOCIATIVE ATTACHMENT RATE CONSTANTS FOR F2 AND NF3 AT 300-DEGREES-K AND 500-DEGREES-K

Electron attachment to F2 and NF3 has been studied in an electron-beam-controlled gas-discharge apparatus over a range of E/P (2-10 kV/cm atm). These experiments were performed in gas mixtures containing small amounts of the halide molecules (≲1%) in an atmosphere of N2 which was included to control the average electron energy. We obtained values for the rate constants for dissociative attachment to F2 and NF 3 as a function of mixture temperature at 300 and 500°K and applied electric field. These results compare favorably with the rate constants deduced from the absolute cross section for these compounds reported by Chantry.