CHEMICAL SITES OF RARE-GAS ATOMS IN AMORPHOUS-SILICON

[1] INTERATOMIC AUGER TRANSITIONS - SURVEY [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1974, 5 (NOV-D) : 273 - 287

[2] IMURA S, 1980, JPN J APPL PHYS, V19, pL65

[3] RELATIVE EFFECT OF EXTRA-ATOMIC RELAXATION ON AUGER AND BINDING-ENERGY SHIFTS IN TRANSITION-METALS AND SALTS [J]. PHYSICAL REVIEW B, 1974, 9 (02) : 381 - 391

[4] MATHEWS DL, 1974, PHYS REV A, V10, P1177

[5] COMPOSITIONAL AND STRUCTURAL-PROPERTIES OF AMORPHOUS SIXC1-X-H ALLOYS PREPARED BY REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) : 5530 - 5532

[6] THEORY OF KLL AUGER ENERGIES INCLUDING STATIC RELAXATION [J]. PHYSICAL REVIEW A, 1973, 7 (05): : 1520 - 1528

[7] Siegbahn K., 1969, ESCA APPL FREE MOL, P156

[8] ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 475 - 480

[9] XPS DETERMINATION OF AMOUNT OF INCORPORATED RARE-GAS IN AMORPHOUS-SILICON FILMS PRODUCED WITH REACTIVE SPUTTERING METHOD [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (11) : 2065 - 2068

[10] X-RAY EXCITED AUGER AND PHOTOELECTRON SPECTRA OF PARTIALLY OXIDIZED MAGNESIUM SURFACES - OBSERVATION OF ABNORMAL CHEMICAL-SHIFTS [J]. SURFACE SCIENCE, 1973, 35 (01) : 82 - 95

[1] INTERATOMIC AUGER TRANSITIONS - SURVEY [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1974, 5 (NOV-D) : 273 - 287

[2] IMURA S, 1980, JPN J APPL PHYS, V19, pL65

[3] RELATIVE EFFECT OF EXTRA-ATOMIC RELAXATION ON AUGER AND BINDING-ENERGY SHIFTS IN TRANSITION-METALS AND SALTS [J]. PHYSICAL REVIEW B, 1974, 9 (02) : 381 - 391

[4] MATHEWS DL, 1974, PHYS REV A, V10, P1177

[5] COMPOSITIONAL AND STRUCTURAL-PROPERTIES OF AMORPHOUS SIXC1-X-H ALLOYS PREPARED BY REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) : 5530 - 5532

[6] THEORY OF KLL AUGER ENERGIES INCLUDING STATIC RELAXATION [J]. PHYSICAL REVIEW A, 1973, 7 (05): : 1520 - 1528

[7] Siegbahn K., 1969, ESCA APPL FREE MOL, P156

[8] ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 475 - 480

[9] XPS DETERMINATION OF AMOUNT OF INCORPORATED RARE-GAS IN AMORPHOUS-SILICON FILMS PRODUCED WITH REACTIVE SPUTTERING METHOD [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (11) : 2065 - 2068

[10] X-RAY EXCITED AUGER AND PHOTOELECTRON SPECTRA OF PARTIALLY OXIDIZED MAGNESIUM SURFACES - OBSERVATION OF ABNORMAL CHEMICAL-SHIFTS [J]. SURFACE SCIENCE, 1973, 35 (01) : 82 - 95