MIX AND MATCH LITHOGRAPHY FOR 0.1 MU-M MOSFET FABRICATION

被引：10
作者：
MIEVILLE, JP
BARRIER, J
SHI, Z
DUTOIT, M
OPPLIGER, Y
MORET, JM
PERRET, A
机构：
[1] Institute for Micro-, Optoelectronics Swiss Federal Institute of Technology
[2] Centre Suisse d'Electronique et de Microtechnique
来源：
MICROELECTRONIC ENGINEERING | 1991年 / 13卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(91)90074-N
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
[No abstract available]
引用
收藏
页码：189 / 192
页数：4
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