IMPACT IONIZATION IN SILICON

被引:133
作者
CARTIER, E
FISCHETTI, MV
EKLUND, EA
MCFEELY, FR
机构
[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY 10598
关键词
D O I
10.1063/1.109064
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electron dynamics for electron energies up to 5 eV has been studied by soft x-ray photoemission spectroscopy. Monte Carlo simulations have been performed to derive the energy dependence of the pair-production rate using these results in combination with published data on the ionization coefficient and on the quantum yield for pair production. The obtained ionization rate shows a very soft threshold at 1.2 eV, approaching the results by Kane [Phys. Rev. 159, 624 (1967)] at higher energies. Several published models have been found to be inconsistent with the full set of experimental data we have considered.
引用
收藏
页码:3339 / 3341
页数:3
相关论文
共 28 条