ELECTRON AND CHEMICAL-KINETICS IN METHANE RF GLOW-DISCHARGE DEPOSITION PLASMAS

被引：158

作者：

KLINE, LE

PARTLOW, WD

BIES, WE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 01期

关键词：

D O I：

10.1063/1.343378

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：70 / 78

页数：9

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