The fine structure of H-alpha and D-alpha under varying discharge conditions

被引：45
作者：
Williams, RC [1 ]
机构：
[1] Cornell Univ, Ithaca, NY USA
来源：
PHYSICAL REVIEW | 1938年 / 54卷 / 08期
关键词：
D O I：
10.1103/PhysRev.54.558
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：558 / 567
页数：10
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