IR AND HIGH-ENERGY ELECTRON-DIFFRACTION ANALYSES OF ELECTRON-BEAM-EVAPORATED MGO FILMS

被引：42

作者：

ABOELFOTOH, MO

PARK, KC

PLISKIN, WA

机构：

[1] IBM CORP,DIV SYST COMMUN,KINGSTON,NY 12401

[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[3] IBM CORP,DIV SYST PROD,E FISHKILL,NY 12533

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 07期

关键词：

D O I：

10.1063/1.324102

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2910 / 2917

页数：8

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