ELECTRONIC-PROPERTIES OF A MONOLAYER OF THALLIUM DEPOSITED ON AG(111)

被引：2

作者：

LEIVA, E ^{[1
]}

机构：

[1] UNIV NACL CORDOBA, FAC CIENCIAS QUIM, CORDOBA, ARGENTINA

来源：

SURFACE SCIENCE | 1995年 / 335卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(95)00443-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The density functional formalism is used to investigate theoretically the underpotential adsorption of Tl on Ag(111). In agreement with experiment, a relatively compact structure is predicted for the adsorbed monolayer. While the work function of the substrate covered by a monolayer of adsorbate is very close to that of the pure adsorbate metal, the position of the effective image charge differs appreciably for both systems. The second harmonic generation response of the system is also analyzed in the quasi-static limit.

引用

页码：83 / 90

页数：8

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