INTERFACE EXAFS USING GLANCING ANGLES

被引:7
作者
Heald, S. M. [1 ]
Tranquada, J. M. [1 ]
Chen, H. [1 ]
机构
[1] Brookhaven Natl Lab, Upton, NY 11973 USA
来源
JOURNAL DE PHYSIQUE | 1986年 / 47卷 / C-8期
关键词
D O I
10.1051/jphyscol:19868158
中图分类号
学科分类号
摘要
The use of glancing angles to obtain EXAFS signals from thin interfacial regions is described. The technique is applicable to the case of a light overlayer on a heavy substrate for which total external reflection can be caused to occur at the interface. In this case the penetration into the substrate is very small (similar to 20-30 A in many cases). Data have been obtained on two systems: Al on Cu and Ag on Au. The Al on Cu samples had 1000 A of Al on Cu and measurements were made on the interface structure as a function of annealing temperature. For anneals above 140 degrees C clear indication of the growth of CuAl2 at the interface is observed. The interface sensitivity was then verified by varying the glancing angle to determine the CuAl2 layer thickness. Even for CuAl2 layers as thin as 100 A, the EXAFS signal is essentially pure CuAl2 with little contamination from the underlying Cu. For Ag on Au there is no compound formation and these techniques were used to look at inter-diffusion as a function of annealing. In particular the Au environment in Ag grain boundaries could be detected.
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页码:293 / 298
页数:6
相关论文
共 13 条
[1]   X-RAY PHOTOABSORPTION OF SOLIDS BY SPECULAR REFLECTION [J].
BARCHEWITZ, R ;
CREMONESEVISICATO, M ;
ONORI, G .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1978, 11 (21) :4439-4445
[2]  
BOSIO L, 1984, J ELECTROANAL CHEM, V180, P265, DOI 10.1016/0368-1874(84)83585-6
[3]   NBZR MULTILAYERS .2. EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE STUDY [J].
CLAESON, T ;
BOYCE, JB ;
LOWE, WP ;
GEBALLE, TH .
PHYSICAL REVIEW B, 1984, 29 (09) :4969-4975
[4]   EXAFS AND SURFACE EXAFS FROM MEASUREMENTS OF X-RAY REFLECTIVITY [J].
FOX, R ;
GURMAN, SJ .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1980, 13 (11) :L249-L253
[5]   A STUDY OF THE INITIAL GROWTH-KINETICS OF THE COPPER-ALUMINUM THIN-FILM INTERFACE REACTION BY INSITU X-RAY-DIFFRACTION AND RUTHERFORD BACKSCATTERING ANALYSIS [J].
HAMM, RA ;
VANDENBERG, JM .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :293-299
[6]  
HEALD SM, 1984, PHYS LETT A, V103, P155, DOI 10.1016/0375-9601(84)90224-X
[7]  
HEALD SM, 1986, MATER RES SOC C P, V54, P165
[8]  
HEALD SM, 1985, MATER RES SOC S P, V37, P437
[9]  
Hentzell H. T. G., 1983, J APPL PHYS, V54, P6123
[10]  
James R., 1958, OPTICAL PRINCIPLES D