THERMAL-OXIDATION OF INAS

被引：15

作者：

LAUGHLIN, DH

WILMSEN, CW

机构：

来源：

THIN SOLID FILMS | 1980年 / 70卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90373-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：325 / 332

页数：8

共 18 条

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[6]

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[7] LOCAL ATOMIC AND ELECTRONIC-STRUCTURE OF OXIDE-GAAS AND SIO2-SI INTERFACES USING HIGH-RESOLUTION XPS [J].

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[8]

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[9] IN-DEPTH PROFILES OF OXIDE-FILMS ON GAAS STUDIED BY XPS [J].

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NAKAMURA, S .

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[10]

REICH RK, UNPUBLISHED

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