WISCONSIN X-RAY-LITHOGRAPHY PROGRAM

被引：0

作者：

WELLS, GM ^{[1
]}

CHEN, G ^{[1
]}

WHITE, V ^{[1
]}

WALLACE, J ^{[1
]}

CERRINA, F ^{[1
]}

LIEN, N ^{[1
]}

机构：

[1] BAKER MFG CO,EVANSVILLE,WI 53536

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1989年 / 60卷 / 07期

关键词：

D O I：

10.1063/1.1141048

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：1636 / 1637

页数：2

共 50 条

[1] MICROMECHANICS FOR X-RAY-LITHOGRAPHY AND X-RAY-LITHOGRAPHY FOR MICROMECHANICS
GUCKEL, H
PRECISION ENGINEERING AND OPTOMECHANICS, 1989, 1167 : 151 - 158
[2] X-RAY-LITHOGRAPHY
HEUBERGER, A
SOLID STATE TECHNOLOGY, 1986, 29 (02) : 93 - 101
[3] X-RAY-LITHOGRAPHY
HEUBERGER, A
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 107 - 121
[4] X-RAY-LITHOGRAPHY
WATTS, RK
SOLID STATE TECHNOLOGY, 1979, 22 (05) : 68 - &
[5] X-RAY-LITHOGRAPHY
HARRELL, S
SOLID STATE TECHNOLOGY, 1985, 28 (05) : 111 - 111
[6] X-RAY-LITHOGRAPHY
YAMAZAKI, S
HAYASAKA, T
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 : 35 - 40
[7] X-RAY-LITHOGRAPHY
GARRETTSON, GA
NEUKERMANS, AP
HEWLETT-PACKARD JOURNAL, 1982, 33 (08): : 14 - 18
[8] X-RAY-LITHOGRAPHY
NAKAYAMA, S
HAYASAKA, T
YAMAZAKI, S
REVIEW OF THE ELECTRICAL COMMUNICATIONS LABORATORIES, 1979, 27 (1-2): : 105 - 115
[9] MOTOROLA IBM COLLABORATION ON X-RAY-LITHOGRAPHY PROGRAM
GALLIGAN, P
BOSS, MJ
SOLID STATE TECHNOLOGY, 1990, 33 (04) : 65 - 66
[10] THE SUPERCONDUCTING X-RAY-LITHOGRAPHY SOURCE PROGRAM AT BROOKHAVEN
WILLIAMS, GP
HEESE, RN
VIGNOLA, G
MURPHY, JB
GODEL, JB
HSIEH, H
GALAYDA, J
SEIFERT, A
KNOTEK, ML
REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (07): : 1628 - 1629