VAPOR DEPOSITION OF TUNGSTEN BY HYDROGEN REDUCTION OF TUNGSTEN HEXAFLUORIDE - PROCESS VARIABLES AND PROPERTIES OF DEPOSIT

被引：22

作者：

BERKELEY, JF

BRENNER, A

REID, WE

机构：

来源：

关键词：

D O I：

10.1149/1.2426649

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：561 / &

共 42 条

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