A METAL DOPING EFFECT IN AN ELECTRON-BEAM SENSITIVE RESIST

被引：3

作者：

YAMADA, M

HATTORI, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 10期

关键词：

D O I：

10.1143/JJAP.20.1969

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1969 / 1970

页数：2

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[4]

YAMADA M, 1980, 2ND P S DRY PROC, P79