ATOMIC CHLORINE CONCENTRATION MEASUREMENTS IN A PLASMA-ETCHING REACTOR .1. A COMPARISON OF INFRARED-ABSORPTION AND OPTICAL-EMISSION ACTINOMETRY

被引：85
作者：
RICHARDS, AD
THOMPSON, BE
ALLEN, KD
SAWIN, HH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期
关键词：
D O I：
10.1063/1.339734
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：792 / 798
页数：7
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