STRAIN IN SELF-IMPLANTED SILICON

被引：13

作者：

CHAMI, AC

LIGEON, E

DANIELOU, R

FONTENILLE, J

EYMERY, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 01期

关键词：

D O I：

10.1063/1.338849

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：161 / 165

页数：5

共 26 条

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