MOSSBAUER STUDY OF INTERFACE MIXING IN FE/NI MULTILAYERS

被引：0

作者：

ACHARYA, BR

PIRAMANAYAGAM, SN

NIGAM, AK

SHRINGI, SN

PRASAD, S

VENKATARAMANI, N

CHANDRA, G

KRISHNAN, R

机构：

[1] INDIAN INST TECHNOL,DEPT PHYS,BOMBAY 400076,MAHARASHTRA,INDIA

[2] TIFR,DIV LOW TEMP PHYS,BOMBAY 400005,MAHARASHTRA,INDIA

[3] INDIAN INST TECHNOL,ACRE,BOMBAY 400076,MAHARASHTRA,INDIA

[4] CNRS,MAGNETISME & MAT MAGNET LAB,F-92195 MEUDON,FRANCE

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 140卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Conversion Electron Mossbauer Spectroscopy (GEMS) studies were carried out on as deposited and annealed Fe/Ni multilayers prepared by rf sputtering, in order to probe the interface. A series of multilayers in which Ni layer thickness was fixed at 25 Angstrom and the Fe layer thickness was varied from 18 to 120 Angstrom, were studied. The width of the Mossbauer lines increases with decreasing Fe layer thickness indicating a mixing at the interface, which was analyzed using specific models.

引用

页码：555 / 556

页数：2

共 6 条

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