REACTION AND STRUCTURE AT METAL-SEMICONDUCTOR INTERFACES

被引：0
|
作者：
SINCLAIR, R
HOLLOWAY, K
KIM, KB
KO, DH
BHANSALI, AS
SCHWARTZMAN, AF
OGAWA, S
机构：
来源：
MICROSCOPY OF SEMICONDUCTING MATERIALS 1989 | 1989年 / 100卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：599 / 607
页数：9
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