A micro-machined capacitive electret microphone

被引:3
作者
Thielemann, C [1 ]
Hess, G [1 ]
机构
[1] Fachhsch Frankfurt Main, Dept Elect Engn, Frankfurt, Germany
来源
DESIGN, TEST, AND MICROFABRICATION OF MEMS AND MOEMS, PTS 1 AND 2 | 1999年 / 3680卷
关键词
silicon microphone; inorganic electret; electret microphone; low stress membrane;
D O I
10.1117/12.341269
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon-based electret materials are presented for the application in micro-machined sensors. Various dielectric layer systems of silicon dioxide and silicon nitride are investigated and compared to the well known single layer silicon dioxide. The superior material system silicon dioxide/silicon nitride is optimised in terms of charge stability, mechanical behaviour and processing capabilities. Only the advantageous combination of low stress and good electret properties allows the realisation of electret membranes for silicon microphones Electret membranes were realized by means of an anisotropic etch process. Various measurements of charge stability were performed and evaluated. For the first time the application of an inorganic electret membrane in a micro-machined capacitive silicon microphone is presented and results are shown. An equivalent noise level of 32 dB(A) could be achieved for an electret microphone with a 4 mm(2) membrane area.
引用
收藏
页码:748 / 756
页数:9
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