共 50 条
- [32] 16nm with 193nm Immersion Lithography and Double Exposure DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION IV, 2010, 7641
- [33] Photochemical surface modification of silicone rubber into photoluminescent material by 193nm ArF excimer laser irradiation Jpn. J. Appl. Phys., 10 Part 1 (1023011-1023017):
- [34] Compaction and rarefaction of fused silica with 193-nm excimer laser exposure OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 1639 - 1650
- [35] Micro-structuring with 193nm laser radiation CHALLENGES IN PROCESS INTEGRATION AND DEVICE TECHNOLOGY, 2000, 4181 : 248 - 253