FLATNESS AND SURFACE ROUGHNESS OF SOME COMMON THIN FILM SUBSTRATE MATERIALS

被引：10

作者：

ANDERSON, RM

NEUDECK, GW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1971年 / 8卷 / 02期

关键词：

D O I：

10.1116/1.1314484

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：454 / &

共 11 条

[1]

BERRY RW, 1968, THIN FILM TECHNOLOGY, P399

[2]

COFFMAN B, 1962, 9 T NAT VAC S, P89

[3] ON RESISTANCE OF CADMIUM SELENIDE FILMS [J].

ELLIS, SG .

[4]

GLANG R, 1967, THIN SOLID FILMS, V1, P309

[5] BEHAVIOR OF CDS THIN FILM TRANSISTORS [J].

MIKSIC, MG ;

SCHLIG, ES ;

HAERING, RR .

[6] MICROWAVE FILM ATTENUATORS FOR FERRITE DEVICES [J].

PETERSON, NC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (04) :493-&

[7]

SCHWARTZ N, 1962, 8 T NAT VAC S, P836

[8]

SCHWARTZ N, 1964, PHYSICS THIN FILMS, V2, P371

SUMI, M ;

SUZUKI, T .

[10]

TICKLE AC, 1969, THIN FILM TRANSISTOR, P75