NEW QUENCHING RATES APPLICABLE TO KRF LASER

被引：45

作者：

EDEN, JG

WAYNANT, RW

SEARLES, SK

BURNHAM, R

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 11期

关键词：

D O I：

10.1063/1.89903

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：733 / 735

页数：3

共 18 条

[1] EMISSION-SPECTRA OF XEBR, XECL, XEF, AND KRF [J].

BRAU, CA ;

EWING, JJ .

JOURNAL OF CHEMICAL PHYSICS, 1975, 63 (11) :4640-4647

[2] RADIATIVE LIFETIME OF KRFSTAR [J].

BURNHAM, R ;

SEARLES, SK .

JOURNAL OF CHEMICAL PHYSICS, 1977, 67 (12) :5967-5968

[3] ULTRAVIOLET-PREIONIZED DISCHARGE-PUMPED LASERS IN XEF, KRF, AND ARF [J].

BURNHAM, R ;

DJEU, N .

APPLIED PHYSICS LETTERS, 1976, 29 (11) :707-709

[4] INFLUENCE OF DILUENT GAS ON XEF LASER [J].

CHAMPAGNE, LF ;

HARRIS, NW .

APPLIED PHYSICS LETTERS, 1977, 31 (08) :513-515

[5]

CHAMPAGNE LF, 1975, 30TH GAS EL C PAL AL

[6] ELECTRONIC STATES OF KRF [J].

DUNNING, TH ;

HAY, PJ .

APPLIED PHYSICS LETTERS, 1976, 28 (11) :649-651

[7]

EDEN JG, 1978, OPT LETT, V2, P13, DOI 10.1364/OL.2.000013

[8]

EDEN JG, UNPUBLISHED

[9] Injection-locked, narrow-band KrF discharge laser using an unstable resonator cavity [J].

Goldhar, J. ;

Murray, J. R. .

OPTICS LETTERS, 1977, 1 (06) :199-201

[10] GAIN AND ABSORPTION-MEASUREMENTS IN A KRFSTAR LASER [J].

HAWRYLUK, AM ;

MANGANO, JA ;

JACOB, JH .

APPLIED PHYSICS LETTERS, 1977, 31 (03) :164-166

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