CONVECTION AND MASS-TRANSPORT IN LASER-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：13

作者：

PATNAIK, S ^{[1
]}

BROWN, RA ^{[1
]}

机构：

[1] MIT,CTR MAT PROC,CAMBRIDGE,MA 02139

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 03期

关键词：

D O I：

10.1149/1.2095722

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：697 / 706

页数：10

共 40 条

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[9] A MATHEMATICAL-MODEL OF THE COUPLED FLUID-MECHANICS AND CHEMICAL-KINETICS IN A CHEMICAL VAPOR-DEPOSITION REACTOR [J].

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[10] A MATHEMATICAL-MODEL OF SILICON CHEMICAL VAPOR-DEPOSITION - FURTHER REFINEMENTS AND THE EFFECTS OF THERMAL-DIFFUSION [J].

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