CHEMICAL PROCESSES IN GLASS POLISHING

被引：859
作者：
COOK, LM
机构：
[1] Galileo Electro-Optics Corp., Sturbridge, MA 01566, Galileo Park
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1990年 / 120卷 / 1-3期
关键词：
D O I：
10.1016/0022-3093(90)90200-6
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Chemical processes which occur during glass polishing are reviewed within the context of current mechanical models for the polishing process. The central chemical process which occurs is the interaction of both the glass surface and the polishing particle with water. A detailed mechanico-chemical model for the polishing process is proposed. © 1990.
引用
收藏
页码：152 / 171
页数：20
相关论文
共 57 条
[1]  
[Anonymous], 1979, CHEM SILICA
[2]  
BANDO Y, 1984, J AM CERAM SOC, V67, pC36
[3]   HIGH-WATER CONTAINING GLASSES [J].
BARTHOLOMEW, RF .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 56 (1-3) :331-342
[4]   STRUCTURE AND PROPERTIES OF ACID SITES IN A MIXED-OXIDE SYSTEM .1. SYNTHESIS AND INFRARED CHARACTERIZATION [J].
BOURNE, KH ;
CANNINGS, FR ;
PITKETHL.RC .
JOURNAL OF PHYSICAL CHEMISTRY, 1970, 74 (10) :2197-&
[5]  
BROWN N, 1984, APR TOP M SCI POL
[6]  
BROWN N, 1987, MISC4476 LAWR LIV NA
[7]  
BROWN N, 1988, OPTICAL FABRICATION, V13
[8]  
BROWN N, 1989, COMMUNICATION
[9]  
BROWN N, 1985, COMMUNICATION
[10]  
BROWN N, 1989, UNPUB DUCTILE GRINDI
123456