THE NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .2. THE SIH2CL2-H2-N2 SYSTEM

被引：40
作者：
CLAASSEN, WAP
BLOEM, J
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
10.1149/1.2130011
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：1836 / 1843
页数：8
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