THE THERMAL-OXIDATION OF SILICON

被引：0

作者：

DEAL, BE ^{[1
]}

机构：

[1] FAIRCHILD CAMERA & INSTRUMENT CORP,ADV RES & DEV LAB,PALO ALTO,CA 94304

来源：

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C101 / C101

页数：1

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